Cullen School of Engineering

Location

Dept. of Electrical & Computer Engineering
N308 Engineering Building 1
Houston, Texas 77004-4005
Phone: 713-743-4400
Fax: 713-743-4444
Department: ece [at] egr [dot] uh [dot] edu
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Faculty

Dr. John C. Wolfe

Professor

N 308 Engineering Building 1

Houston, Texas 77204-4005

Tel: 713-743-4449 | Fax: 713-743-4444

Email: wolfe [at] uh [dot] edu

Education

  • BS Physics, University of Rochester
  • PhD Physics, University of Rochester

Awards and Honors

Research

Research Interests

  • Dr. Wolfe has developed a research laboratory in microfabrication. He has worked on high density electron beam addressed archival storage schemes with the goal of developing a library system providing access to the Library of Congress. His current areas of research are integrated circuit metallization, resist evaluation, ion beam lithography, and super-conducting thin films for microwave and high current applications.


Presentations

Selected Publications

Selected Publications

  • B. P. Craver, and J.C. Wolfe, "Neutral Particle Lithography: A Simple Solution to Charge Related Artefacts in Ion Beam Proximity Printing" Journal of Physics D, Vol. 41, 024007-024018, Jan. 2008 (Invited).

  • Bhargava, M., W. Donner, A. K. Srivastava, and J.C. Wolfe, "Bragg Diffraction, Synchrotron X-Ray Reflectance, and X-Ray Photoelectron Spectroscopy Studies of Low Temperature Plasma Oxidation of Native SiO2 on SOI" J. Vac. Sci. Technol. B, Vol. 26, 305-309, Jan. 2008.

  • Craver, Barry, Hatem Nounu, James Wasson, and J.C. Wolfe, "Neutral Particle Proximity Lithography: Non-Contact Nanoscale Printing without Charge-Related Artifacts" J. Vac. Sci. Technol. B, Vol. 26, 1866-1870, Nov. 2008.

  • Parikh, Dhara, Barry Craver, Hatem Nounu, Fu-on Fong, and J.C. Wolfe, "Nanoscale Pattern Definition on Non-Planar Surfaces using Ion Beam Proximity Lithography and Conformal, Plasma-Deposited Resist," Journ. Microelectromechanical Systems, Vol. 17, 735-740, June 2008.

  • Yao, Manwen, Ooi-Kiang Tan, Swee-Chuan Tjin, and J.C. Wolfe, "Effects of Intermediate Dielectric Films on Multilayer Surface Plasmon Resonance Behavior," Acta Biomaterialia, Vol. 4, 2016-27, Nov. 2008.

  • Yao, M. and J.C. Wolfe, "A Laser-induced Fluorescence Biosensor by Using Ellipsoidal Reflector," Optics and Laser Technology, 39, 1040-1045, 2007.

  • Craver, B., A. Roy, H. Nounu, and J.C. Wolfe, "Mechanical Nanostepping for Atom Beam Lithography," J. Vac. Sci. Technol. B, 25(6), 2192-2194, 2007.

  • Guo, H.-J., B. Craver, J. Reynolds, and J.C. Wolfe, "Design Studies for a High Brightness, Energetic Neutral Atom Source for Proximity Lithography," J. Vac. Sci. Technol. B, 25(6), 2188-2191, 2007.

  • V. Zomorrodian, B. Craver, G. Radhakrishnan, M. Patel, E. J. Charlson, P. Ruchhoeft and J.C. Wolfe, "Threshold voltage adjustment on spherical, single-crystal silicon substrates by focused ion beam implantation," J. Vac. Sci. Technol. B 24, 3221, 2006

  • V. Parekh, A. Ruiz, P. Ruchhoeft, H. Nounu, D. Litvinov and J.C. Wolfe, "Estimation of scattered particle exposure in ion beam aperture array lithography," J. Vac. Sci. Technol. B 24, 2915, 2006

  • V. Parekh, C. E, D. Smith, A. Ruiz, J.C. Wolfe, P. Ruchhoeft, E. Svedberg, S. Khizroev and D. Litvinov, "Fabrication of a High Anisotropy Nanoscale Patterned Magnetic Recording Medium For Data Storage Applications," Nanotechnology, 17, 2079, 2006

  • E. Chunsheng, D. Smith, S. Khizroev, D. Weller, J. Wolfe, and D. Litvinov, "Physics of Patterned Medium Recording: Design Considerations," Journal of Applied Physics, Vol. 98, No. 2, pp. 1-8, 2005.

  • J.C. Wolfe, S.V. Pendharkar, "Reactive ion etching of silicon stencil masks in the presence of an axial magnetic field,'' Journal Vac. Sci. Technology, Vol. B13, pp. 2588-2592, 1995.

  • J.C. Wolfe, A. Chalupka, H. Loschner, et. al., "Distortion analysis of stencil masks with internal stress-relief structures,'' Journal Vac. Sci. Technology, Vol. B13, pp. 2613-2617, 1995.

  • J.C. Wolfe, J. Wosik, L.M. Xie, et. al., "Flux quantization in weak links of YBCO bulk materials," Physical Review, Vol. 51, pp. 16289-16301, 1995.


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